EVALUATION OF RECENT R&D EQUIPMENT ON LOAN TO PAG

Document Type: 
Document Number (FOIA) /ESDN (CREST): 
CIA-RDP78B04747A002300060008-3
Release Decision: 
RIPPUB
Original Classification: 
S
Document Page Count: 
1
Document Creation Date: 
December 28, 2016
Document Release Date: 
July 16, 2001
Sequence Number: 
8
Case Number: 
Publication Date: 
February 16, 1966
Content Type: 
MF
File: 
AttachmentSize
PDF icon CIA-RDP78B04747A002300060008-3.pdf54.39 KB
Body: 
~~:~ ~ Approved For~ease 20 ~;, 0~~-860474 02300060008-3 ~~~ . Declass Review by~ NIMA / DoD PO~OSB~M-111-66 6 February 1966 MEMORANDUM FOR: Assistant for Plans and Development, NP C SUSTECT: Evaluation of Recent R&D Equipment on L an to PAG measurement, the older Projected Scale Micrometer will e used. __ 1. The equipment evaluated by the Photographic Anal sis Group during the past month has included the Projected Scale 'crometer, 1.3X Widefield Objective, 2X Rhomboid E~repiece wi h its compen- sating eyepiece and the Gonimete mpensating eyepiece. 2. The photointerpreters in PAG were enthusiastic out the useful- ness of all of the items except the Projected Scale Mic ometer. This item, although improved over the original model, will n t be as useful as the filar eyepiece.. In cases where the Zoom 70 is p eferred for 3. A modification was suggested for the chip clamp the film stage to allow more latitude in "Y" travel of present knurled knob located at the center of the chip could be removed and finger lift tabs made as extension This would allow a flat plate to be used without any ve to prohibit "Y" travel when using the 1.3X objectives. included for your review. Provision should also be mad Filar Eyepiece in either the left or right eyepiece tub Stereoviewer. 4. It is the consensus of the Photographic Analysi items evaluated will be of considerable value to the ph Improving the capability of existing equipment has been these actions. Distribution: Orig & 1 - Addressee ;;.Y ~?'??" ~ 1 - Asst. for PA ~; ~, Earl^~:d ir~-n ~cte:^~ta~ 1 - IPO~OSB~PAG ' ;R~ aid dattr:~rsc dv,~i2~~iiic ii]?t ~t~'Pi'~ent; 1 - Sketch Approved For Release 200 ng device on he stage. The lamping device of the device. tical pz?ojections for uses of the of the High Power Group that the tointerf~reters. accomplished by 13 : CIA-RDP78B04747A002300060008-3